Prof. Makoto Sekine, university of Nagoya (Japan)
Cryogenic plasma etching in semiconductor processes with reduced environmental impact
Dr. Thorsten Lill, Lam Research (USA)
Elementary processes in cryo etching of dielectric high aspect ratio structures
Dr. Mituhiro Omura, Kioxia Corp. (Japan)
Expectation for cryo etching technology for 3D flash memory
Loading... 
