Prof. Makoto Sekine, university of Nagoya (Japan)
Cryogenic plasma etching in semiconductor processes with reduced environmental impact
Dr. Thorsten Lill, Lam Research (USA)
Elementary processes in cryo etching of dielectric high aspect ratio structures
Dr. Mituhiro Omura, Kioxia Corp. (Japan)
Expectation for low temperature HAR etching in 3D flash memory fabrication
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